Intensity-dependent loss properties of window materials at 248 nm.
نویسندگان
چکیده
Transmission of fused silica, CaF(2), LiF, and MgF(2) is measured using 450-fsec, 248-nm pulses in the range 10-120 GW/cm(2). Different loss mechanisms such as scattering of transmitted radiation, color-center formation, and multiphoton absorption were studied separately. For fused silica a two-photon absorption mechanism is found, while for CaF(2), LiF, and MgF(2) three-photon absorption and absorption due to color-center formation are found as dominant absorption mechanisms.
منابع مشابه
Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography
Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography The aqueous base development step is one of the most critical processes in modern lithographic imaging technology. Sinusoidal modulation of the exposing light intensity must be converted to a step function in the resist film during the development process. Thus, in designing high-performance resi...
متن کاملCytotoxicity and mutagenicity of low intensity, 248 and 193 nm excimer laser radiation in mammalian cells.
The cytotoxicity of 193 and 248 nm excimer laser radiation was compared to that produced by a germicidal lamp (predominantly 254 nm) using Chinese hamster ovary cells (CHO), and a human diploid fibroblast line, AG-1522A. Excimer laser radiation at 248 nm (3.5 X 10(2) w/m2) and germicidal radiation (5.3 X 10(-5) w/m2) caused toxicity in both cell lines, with the AG-1522A cells (D37 = 7-8 J/m2) b...
متن کاملReview of
Introduction Lithography with 157-nm fluorine lasers is rapidly emerging as a viable technology for the post-193-nm era [1–3]. In fact, it may become the technology of choice for 100to 70-nm nodes. It is attractive for several reasons, the most important being that it is fundamentally an extension of optical lithography at the longer wavelengths of 248 and 193 nm. Therefore, it holds the promis...
متن کاملPhotodissociation dynamics of the methyl perthiyl radical at 248 and 193 nm using fast-beam photofragment translational spectroscopy.
The photodissociation dynamics of the methyl perthiyl radical (CH3SS) have been investigated using fast-beam coincidence translational spectroscopy. Methyl perthiyl radicals were produced by photodetachment of the CH3SS(-) anion followed by photodissociation at 248 nm (5.0 eV) and 193 nm (6.4 eV). Photofragment mass distributions and translational energy distributions were measured at each diss...
متن کاملInteraction of wide-band-gap single crystals with 248-nm excimer laser irradiation. X. Laser-induced near-surface absorption in single-crystal NaCl
Ultraviolet laser-induced desorption of neutral atoms and molecules from nominally transparent, ionic materials can yield particle velocities consistent with surface temperatures of a few thousand kelvin even in the absence of visible surface damage. The origin of the laser absorption required for this surface heating has been often overlooked. In this work, we report simultaneous neutral emiss...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
- Optics letters
دوره 14 21 شماره
صفحات -
تاریخ انتشار 1989